Hakuto ion etching machine 20IBE-J product advantages:

Main advantages of Hakuto ion etching machine:

1. Dry process microfabrication devices have been widely used in the development, research, and mass production of thin film magnetic heads, semiconductor components, MR sensors, and other fields

The characteristics of physical etching can be used for processing regardless of the material used, so it can be widely applied in various fields

3. Configure and use Kaufman ion source from the United States

4. The RF angle can be adjusted arbitrarily, and etching can be processed into vertical, inclined, and other shapes as needed

5. The substrate is directly mounted on a direct cooling device, so it can be etched at low temperatures

6. Configure a revolution rotation transmission mechanism to ensure a relatively uniform and smooth surface for the etched material

7. The machine design uses automated operation processes, so it can have a very user-friendly production process